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P388 – 4″ HV thermal evaporation OUT e.V.


HV thermal evaporation system for thin film deposition at 4″ substrates

Year of delivery


Installation site

OUT e.V. Berlin, Germany

Design Features

  • HV thin film deposition system with single thermal evaporation source.
  • Sample manipulator with integrated sample shutter and maximal sample temperature above 600°C.
  • Thickness monitor for deposition rate measurement and end point detection.

Special Features

  • Ports for optional in situ analytic (e.g. ellipsometry).
  • Different sample sizes from 4″ wafer down to 10mm x 10mm samples can be handled (using different kind of sample adapters).

Outer Dimensions

Technical specifications and performance values


Evaporation chamber


About 380 mm width, about 520 mm depth, about 500 mm height (D-shape chamber with door)


stainless steel


Evaporation chamber

Base pressure

< 8 *10-8 mbar

Pump down time

19 hours to < 2 * 10-7 mbar

Chamber pumping

Turbo pumping stage, chamber door differentially pumped by dry foreline pump

Manipulator features

Evaporation chamber

Sample size

diameter max. 4″ substrate

Motion axes

Pneumatic sample shutter (part of the manipulator head)


Room temperature (not stabilized) up to 600°C at sample

Performance test results

Chamber pump down
Long time sample heating